US demand for photoresists and ancillaries will grow 11.7 percent annually through 2007. Gains will be driven by a strong recovery in semiconductor shipments and a shift to higher priced advanced photoresists. Strong opportunities also exist for high performance ancillaries that can boost etch rates, throughput and resolution, such as anti-reflective coatings.
This study analyzes the $810 million US photoresists and ancillaries industry. It presents historical data for 1992, 1997 and 2002 and forecasts to 2007 and 2012 by photoresist type (e.g., dry film, G-line, I-line, deep ultraviolet); by ancillary product (e.g., strippers and residue removers, photoresist developers, anti-reflective coatings); and by application.
The study also examines the market environment, reviews technology, details industry structure and market share, and profiles 30 companies including Arch Chemicals, Ashland Chemical, ATM1, Brewer Science, Clariant, DuPont, JSR Micro, MacDermid, Mallinckrodt Baker, Rohm and Haas, Sumitomo Chemical, and Tokyo Ohka Kogyo.
